<?xml version="1.0" encoding="utf-8"?>
<?xml-stylesheet href="http://syndication.iop.org/rss.css" type="text/css" media="screen"?>


<rss version="2.0" xmlns:blogChannel="http://backend.userland.com/blogChannelModule">

<channel>
<title>Semiconductor Science and Technology latest papers</title>
<link>http://stacks.iop.org/0268-1242</link>
<description>Essential reading for all those involved in semiconductor research and applications. SST covers properties of bulk, low-dimensional and amorphous semiconductors, computational semiconductor physics, crystal growth and preparation of materials, layer and device properties, electronic and optoelectronic devices, technology including lithography, materials and device reliability, among others.</description>
<language>en-gb</language>
<copyright>Copyright &#169; IOP Publishing 2009</copyright>
<pubDate>Thu, 01 Jan 1970 00:00:00 GMT</pubDate>
<lastBuildDate>Thu, 01 Jan 1970 00:00:00 GMT</lastBuildDate>
<docs>http://syndication.iop.org/about/</docs>
<webMaster>custserv@iop.org (Customer Services)</webMaster>

<image>
<title>Semiconductor Science and Technology</title>
<url>http://images.iop.org/website-logos/ejs_logo.png</url>
<link>http://stacks.iop.org/</link>
</image>

<item>
<title>Electronic structure properties of the In(Ga)As/GaAs quantum dot&#x2013;quantum well tunnel-injection system</title>
<link>http://stacks.iop.org/0268-1242/24/i=8/a=085011?rss=2.0</link>
<description>Author(s): Grzegorz Sek, Janusz Andrzejewski, Krzysztof Ryczko, Przemyslaw Poloczek, Jan Misiewicz, Elizaveta S Semenova, Aristide Lemaitre, Gilles Patriarche and Aberrahim Ramdane&lt;br&gt;Affiliation(s): Institute of Physics, Wroclaw University of Technology, Wybrzeze Wyspianskiego 27, 50-370 Wroclaw, Poland; Laboratoire de Photonique et de Nanostrucures, Centre National de la Recherche Scientifique, Route de Nozay, F-91460 Marcoussis, France</description>
<pubDate>Thu, 02 Jul 2009 23:00:00 GMT</pubDate>
</item>

<item>
<title>Very low hysteresis organic thin-film transistors</title>
<link>http://stacks.iop.org/0268-1242/24/i=8/a=085009?rss=2.0</link>
<description>Author(s): Chunhong Li, Feng Pan, Feng Zhu, De Song, He Wang and Donghang Yan&lt;br&gt;Affiliation(s): State Key Laboratory of Polymer Physics and Chemistry, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Graduate School of Chinese Academy of Sciences, Changchun 130022, People's Republic of China</description>
<pubDate>Thu, 02 Jul 2009 23:00:00 GMT</pubDate>
</item>

<item>
<title>Efficiency improvement of single-junction InGaP solar cells fabricated by a novel micro-hole array surface texture process</title>
<link>http://stacks.iop.org/0268-1242/24/i=8/a=085007?rss=2.0</link>
<description>Author(s): Yi-An Chang, Zhen-Yu Li, Hao-Chung Kuo, Tien-Chang Lu, Su-Fan Yang, Li-Wen Lai, Li-Hong Lai and Shing-Chung Wang&lt;br&gt;Affiliation(s): Millennium Communication Co., Ltd, Hsinchu Industrial Park, 303, Taiwan; Department of Photonics &amp; Institute of Electro-Optical Engineering, National Chiao-Tung University, Hsinchu, 300, Taiwan</description>
<pubDate>Thu, 02 Jul 2009 23:00:00 GMT</pubDate>
</item>

<item>
<title>Enhanced light output power of GaN-based vertical-injection light-emitting diodes with a 12-fold photonic quasi-crystal by nano-imprint lithography</title>
<link>http://stacks.iop.org/0268-1242/24/i=8/a=085008?rss=2.0</link>
<description>Author(s): H W Huang, C H Lin, K Y Lee, C C Yu, J K Huang, B D Lee, H C Kuo, K M Leung and S C Wang&lt;br&gt;Affiliation(s): Institute of Electro-Optical Engineering, National Chiao Tung University, Hsinchu 300, Taiwan, Republic of China; Luxtaltek Corporation, Chunan, Miaoli 350, Taiwan, Republic of China; Department of Computer and Information Science, Polytechnic Institute, New York University, Six Metrotech Center, Brooklyn, NY 11201, USA</description>
<pubDate>Thu, 02 Jul 2009 23:00:00 GMT</pubDate>
</item>

<item>
<title>Charge trapping and reliability characteristics of sputtered Y2O3 high-k dielectrics on N- and S-passivated germanium</title>
<link>http://stacks.iop.org/0268-1242/24/i=8/a=085006?rss=2.0</link>
<description>Author(s): C Mahata, M K Bera, T Das, S Mallik, M K Hota, B Majhi, S Verma, P K Bose and C K Maiti&lt;br&gt;Affiliation(s): Department of Electronics and ECE, Indian Institute of Technology, Kharagpur 721302, India; Frontier Research Center, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan; Institute of Physics, Bhubaneswar 751005, India; Mechanical Engineering Departments, Jadavpur University, Jadavpur, Kolkata 700032, India</description>
<pubDate>Thu, 02 Jul 2009 23:00:00 GMT</pubDate>
</item>

<item>
<title>A theoretical study of laser structures based on dilute-nitride InAsN for mid-infrared operation</title>
<link>http://stacks.iop.org/0268-1242/24/i=8/a=085010?rss=2.0</link>
<description>Author(s): M Debbichi, S Ridene, H Bouchriha, A Ben Fredj, M Said, J-L Lazzari, Y Cuminal and P Christol&lt;br&gt;Affiliation(s): Unite de Recherche de Physique des Solides, Departement de Physique, Faculte des Sciences de Monastir, 5019 Monastir, Tunisia; Unite de Recherche de Physique Quantique et Photonique, Departement de Physique, Faculte des Sciences de Tunis, Universite de Tunis El Manar, Campus Universitaire, 1060 Tunis, Tunisia; Centre Interdisciplinaire de Nanoscience de Marseille (CINaM), UPR-CNRS 3118 associee a Aix-Marseille Universite, Case 913, Campus de Luminy, 13288 Marseille cedex 9, France; Institut d'Electronique du Sud (IES), UMR CNRS 5214, Case 067, Universite Montpellier 2, 34095 Montpellier cedex 05, France</description>
<pubDate>Thu, 02 Jul 2009 23:00:00 GMT</pubDate>
</item>

<item>
<title>Detection of a shallow level in a semiconductor by admittance spectroscopy</title>
<link>http://stacks.iop.org/0268-1242/24/i=8/a=085004?rss=2.0</link>
<description>Author(s): Hao Yuan, Hongyun Zhang and Fang Lu&lt;br&gt;Affiliation(s): Surface Physics Laboratory, Laboratory of Advanced Materials, Fudan University, Shanghai, People's Republic of China</description>
<pubDate>Mon, 29 Jun 2009 23:00:00 GMT</pubDate>
</item>

<item>
<title>Scanning transmission electron microscopy determination of critical InAs QD parameters from high-quality focused ion beam lamellas</title>
<link>http://stacks.iop.org/0268-1242/24/i=8/a=085001?rss=2.0</link>
<description>Author(s): A Taurino, M Catalano, M Lomascolo, A Persano, A Convertino and L Cerri&lt;br&gt;Affiliation(s): Institute for Microelectronics and Microsystems, Italian National Research Council (CNR-IMM)--Lecce Section, via Monteroni, 73100 Lecce, Italy; Institute for the Study of Nanostructured Materials, Italian National Research Council (CNR-ISMN)--Montelibretti Section, via Salaria Km. 29.300, 00016 Roma, Italy</description>
<pubDate>Mon, 29 Jun 2009 23:00:00 GMT</pubDate>
</item>

<item>
<title>Effects of body doping on threshold voltage and channel potential of symmetric DG MOSFETs with continuous solution from accumulation to strong-inversion regions</title>
<link>http://stacks.iop.org/0268-1242/24/i=8/a=085005?rss=2.0</link>
<description>Author(s): Feng Liu, Lining Zhang, Jian Zhang, Jin He and Mansun Chan&lt;br&gt;Affiliation(s): TSRC, Key Laboratory of Microelectronic Devices and Circuits of the Ministry of Education of China, Institute of Microelectronics, School of Electronic Engineering and Computer Science, Peking University, Beijing 100871, People's Republic of China; Department of Electronic and Computer Engineering, Hong Kong University of Science &amp; Technology, Clearwater Bay, Kowloon, Hong Kong, People's Republic of China; Micro &amp; Nano Electronic Device and Integrated Technology Group, The Key Laboratory of Integrated Microsystems, Peking University Shenzhen Graduate School, Shenzhen 518055, People's Republic of China</description>
<pubDate>Mon, 29 Jun 2009 23:00:00 GMT</pubDate>
</item>

<item>
<title>Transport and performance of a gate all around InAs nanowire transistor</title>
<link>http://stacks.iop.org/0268-1242/24/i=8/a=085003?rss=2.0</link>
<description>Author(s): Khairul Alam&lt;br&gt;Affiliation(s): Department of Electrical and Electronic Engineering, East West University, Dhaka-1212, Bangladesh</description>
<pubDate>Mon, 29 Jun 2009 23:00:00 GMT</pubDate>
</item>

<item>
<title>Stability of thin film transistors incorporating a zinc oxide or indium zinc oxide channel deposited by a high rate sputtering process</title>
<link>http://stacks.iop.org/0268-1242/24/i=8/a=085002?rss=2.0</link>
<description>Author(s): A J Flewitt, J D Dutson, P Beecher, D Paul, S J Wakeham, M E Vickers, C Ducati, S P Speakman, W I Milne and M J Thwaites&lt;br&gt;Affiliation(s): Electrical Engineering Division, Cambridge University, J J Thomson Avenue, Cambridge, CB3 0FA, UK; Plasma Quest Ltd., Unit 1B, Rose Estate, Osborn Way, Hook, Hampshire, RG27 9UT, UK; Department of Materials Science and Metallurgy, Cambridge University, Pembroke Street, Cambridge, CB2 3QZ, UK; 3T Technologies Ltd, 7, Chapel Drive, Little Waltham, Chelmsford, Essex, CM3 3LW, UK</description>
<pubDate>Mon, 29 Jun 2009 23:00:00 GMT</pubDate>
</item>

</channel>
</rss>