Plasma Sources Science and Technology latest papers http://stacks.iop.org/0963-0252 Plasma Sources Science and Technology is a single interdisciplinary form for physicists, engineers and materials scientists in the increasingly significant non-fusion areas of plasma science. Areas covered include materials growth and processing, light sources, display devices and charged particle sources. en-gb Copyright © IOP Publishing 2009 Thu, 01 Jan 1970 00:00:00 GMT Thu, 01 Jan 1970 00:00:00 GMT http://syndication.iop.org/about/ custserv@iop.org (Customer Services) Plasma Sources Science and Technology http://images.iop.org/website-logos/ejs_logo.png http://stacks.iop.org/ Capacitively coupled plasma used to simulate Titan's atmospheric chemistry http://stacks.iop.org/0963-0252/19/i=1/a=015008?rss=2.0 Author(s): G Alcouffe, M Cavarroc, G Cernogora, F Ouni, A Jolly, L Boufendi and C Szopa<br>Affiliation(s): Universite de Versailles St Quentin, LATMOS BP3 - 91371 Verrieres-le-Buisson Cedex France; MID Dreux Innovation, 4 rue Albert Caquot, 28500 Vernouillet, France; LISA, Universite Paris 12, 61 avenue du General de Gaulle, 94010 Creteil Cedex, France; GREMI Universite d'Orleans BP6744 - 45067 Orleans Cedex2 France; UPMC, Univ Paris 06, LATMOS BP3-91371 Verrieres-le-Buisson Cedex France Tue, 10 Nov 2009 00:00:00 GMT Comprehensive analysis of the effect of atomic and molecular metastable state excitation on air plasma composition behind strong shock waves http://stacks.iop.org/0963-0252/19/i=1/a=015007?rss=2.0 Author(s): A M Starik, N S Titova and I V Arsentiev<br>Affiliation(s): Central Institute of Aviation Motors, Aviamotornaya 2, Moscow 111116, Russia Tue, 10 Nov 2009 00:00:00 GMT Effect of humidity on gas temperature in the afterglow of pulsed positive corona discharge http://stacks.iop.org/0963-0252/19/i=1/a=015009?rss=2.0 Author(s): Ryo Ono, Yoshiyuki Teramoto and Tetsuji Oda<br>Affiliation(s): Department of Advanced Energy, The University of Tokyo, 5-1-5 Kashiwanoha, Kashiwa, Chiba 227-8568, Japan; Department of Electrical Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan Tue, 10 Nov 2009 00:00:00 GMT Efficient production of microwave bubble plasma in water for plasma processing in liquid http://stacks.iop.org/0963-0252/19/i=1/a=015010?rss=2.0 Author(s): T Ishijima, H Sugiura, R Saito, H Toyoda and H Sugai<br>Affiliation(s): Plasma Nanotechnology Research Center, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan; Department of Electrical Engineering and Computer Science, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan; Department of Electronics and Information Engineering, Chubu University, 1200 Matsumoto-cho, Kasugai 487-8501, Japan Tue, 10 Nov 2009 00:00:00 GMT Charge distribution of particles in an irradiated dust cloud http://stacks.iop.org/0963-0252/19/i=1/a=015006?rss=2.0 Author(s): Mahendra Singh Sodha, Amrit Dixit, Sweta Srivastava, S K Mishra, M P Verma and L Bhasin<br>Affiliation(s): Disha Institute of Management and Technology, Satya Vihar, Vidhan Sabha-Chandrakhuri Marg, Mandir Hasaud, Raipur 492101, Chattisgarh, India; Department of Education Building, University of Lucknow, Lucknow 226007, India; Department of Physics, Indian Institute of Technology, New Delhi 110016, India Tue, 10 Nov 2009 00:00:00 GMT The effect of magnetic configuration on ion acceleration from a compact helicon source with permanent magnets http://stacks.iop.org/0963-0252/19/i=1/a=015004?rss=2.0 Author(s): V F Virko, Yu V Virko, V M Slobodyan and K P Shamrai<br>Affiliation(s): Institute for Nuclear Research, NAS of Ukraine, 47 Prospect Nauki, Kiev 03680, Ukraine Mon, 19 Oct 2009 23:00:00 GMT Heat flux to an asymmetric anode in a hot refractory anode vacuum arc http://stacks.iop.org/0963-0252/19/i=1/a=015002?rss=2.0 Author(s): A Shashurin, I I Beilis and R L Boxman<br>Affiliation(s): Electrical Discharge and Plasma Laboratory, Department of Interdisciplinary Studies, School of Electrical Engineering, Fleischman Faculty of Engineering, Tel Aviv University, PO Box 39040, Tel Aviv 69978, Israel Mon, 19 Oct 2009 23:00:00 GMT Dual-frequency capacitive radiofrequency discharges: effect of low-frequency power on electron density and ion flux http://stacks.iop.org/0963-0252/19/i=1/a=015005?rss=2.0 Author(s): J P Booth, G Curley, D Maric and P Chabert<br>Affiliation(s): Laboratoire de Physique des Plasmas, CNRS UMR 7648, Ecole Polytechnique, 91128 Palaiseau, France; Institute of Physics, Pregrevica 118, 11080 Zemun, Belgrade, Serbia Mon, 19 Oct 2009 23:00:00 GMT A global (volume averaged) model of a chlorine discharge http://stacks.iop.org/0963-0252/19/i=1/a=015001?rss=2.0 Author(s): E G Thorsteinsson and J T Gudmundsson<br>Affiliation(s): Science Institute, University of Iceland, Dunhaga 3, IS-107 Reykjavik, Iceland; Department of Electrical and Computer Engineering, University of Iceland, Hjardarhaga 2-6, IS-107 Reykjavik, Iceland Mon, 19 Oct 2009 23:00:00 GMT Large-area surface wave plasmas using microwave multi-slot antennas for nanocrystalline diamond film deposition http://stacks.iop.org/0963-0252/19/i=1/a=015003?rss=2.0 Author(s): J Kim, K Tsugawa, M Ishihara, Y Koga and M Hasegawa<br>Affiliation(s): Nanotube Research Center, National Institute of Advanced Industrial Science and Technology, Central 5, Higashi 1-1-1, Tsukuba, Ibaraki 305-8565, Japan Mon, 19 Oct 2009 23:00:00 GMT